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Location: Fab10N Singapore
Department: Process Development – Singapore (Photolithography)
Project title: Edge Placement Error Modeling and Optimization
Project Description:
Develop and optimize models for overlay and critical dimension uniformity improvement
Project scope: Introduction to photolithography for semiconductor patterning and control with
Deliverable:
develop and deploy edge placement error model for photolithography
Skillset required:
mathematical modeling and numerical analysis with programming knowledge preffered
Characterization techniques: SEM, optical imaging.
Course of interest:
Semiconductor Manufacturing, Nanomaterials, Physics, Mathematical modeling, Programming.
Duration period: 4-6 months (minimum 4 months)
About Micron Technology, Inc.
We are an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich lifefor all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND, and NOR memory and storage products through our Micron® and Crucial® brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence and 5G applications that unleash opportunities — from the data center to the intelligent edge and across the client and mobile user experience.
To learn more, please visit micron.com/careers
All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.
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